Event
Understanding the New International Design Registration (IDR) System
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On May 13, 2015 the United States and Japan became members of the Hague System for the International Registration of Industrial Designs, administered by the World Intellectual Property Organization (WIPO). This allows eligible applicants to register up to 100 2-D and 3-D designs in a single standardized application, filed in a single language and reviewed for registration formalities, with payment of a single fee. Applications can be filed directly through WIPO or, for US nationals, directly through the USPTO. International design applications can also serve as a basis for a US design patent following substantive US examination.
However, the United States has taken certain exceptions to the requirements of the Hague System to which all potential filers should pay attention before filing an international application to protect a design in the United States. Join our panel as they take a closer look at the new rules adopted by the USPTO and the implications for design applications and prosecution. Attorneys from our US and European offices will discuss:
- Common pitfalls in international design prosecution
- Best practices for filing under the Hague System
- Advantages and disadvantages of the international design registration